✦ LIBER ✦
Experimental Analysis of Within-Die Process Variation in 65 and 180 nm Complementary Metal–Oxide–Semiconductor Technology Including Its Distance Dependences
✍ Scribed by Ansari, Tania; Imafuku, Wataru; Yasuda, Masahiro; Mattausch, Hans Jürgen; Koide, Tetsushi
- Book ID
- 126709559
- Publisher
- Institute of Pure and Applied Physics
- Year
- 2012
- Tongue
- English
- Weight
- 1013 KB
- Volume
- 51
- Category
- Article
- ISSN
- 0021-4922
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