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Experimental 0.25-μm-gate fully depleted CMOS/SIMOX process using a new two-step LOCOS isolation technique
✍ Scribed by Ohno, T.; Kado, Y.; Harada, M.; Tsuchiya, T.
- Book ID
- 114536138
- Publisher
- IEEE
- Year
- 1995
- Tongue
- English
- Weight
- 648 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0018-9383
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