✦ LIBER ✦
Expanding thermal plasma for low-k dielectrics: engineering the film chemistry by means of specific dissociation paths in the plasma
✍ Scribed by M. Creatore; W.M.M. Kessels; Y. Barrell; J. Benedikt; M.C.M. van de Sanden
- Publisher
- Elsevier Science
- Year
- 2004
- Tongue
- English
- Weight
- 221 KB
- Volume
- 7
- Category
- Article
- ISSN
- 1369-8001
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