Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

✍ Scribed by Liberman, V.; Rothschild, M.; Sedlacek, J. H. C.; Uttaro, R. S.; Grenville, A.; Bates*, A. K.; Van Peski*, C.

• Book ID: 115423362
• Publisher: Optical Society of America
• Year: 1999
• Tongue: English
• Weight: 292 KB
• Volume: 24
• Category: Article
• ISSN: 0146-9592
• DOI: 10.1364/OL.24.000058