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Excimer laser cleaning of Si(100) surfaces at 193 and 248 nm studied by LEED, AES and XPS spectroscopies

✍ Scribed by R. Larciprete; E. Borsella


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
517 KB
Volume
76
Category
Article
ISSN
0368-2048

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