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Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application

✍ Scribed by Duttagupta, Shubham; Ma, Fa-Jun; Hoex, Bram; Aberle, Armin G.


Book ID
121433637
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
552 KB
Volume
120
Category
Article
ISSN
0927-0248

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