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EXAFS study on yttrium oxide thin films deposited by RF plasma enhanced MOCVD under the influence of varying RF self-bias

โœ Scribed by Chopade, S.S.; Nayak, C.; Bhattacharyya, D.; Jha, S.N.; Tokas, R.B.; Sahoo, N.K.; Patil, D.S.

Book ID
125512670
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
842 KB
Volume
314
Category
Article
ISSN
0169-4332

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