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Evolution of SiGe nanoclusters and micro defects in the Si1−xGex layer fabricated by two-step ion implantation and subsequent thermal annealing

✍ Scribed by Wenting Xu; Hailing Tu; Qinghua Xiao; Qing Chang; Zongfeng Li; Dali Liu


Book ID
116244408
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
869 KB
Volume
257
Category
Article
ISSN
0169-4332

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