The dissociative oxygen adsorption on a Rh(110) surface has been studied by monitoring the changes in the O ls spectra during oxygen exposure at 270 and 570 K. The site-sensitive O ls binding energy was used as a fingerprint of the adatom adsorption geometry and the O ls intensity as a measure of th
โฆ LIBER โฆ
Evidence from photoelectron spectroscopy for dissociative adsorption of oxygen on nickel oxide
โ Scribed by M.W. Roberts; R.St.C. Smart
- Publisher
- Elsevier Science
- Year
- 1981
- Weight
- 81 KB
- Volume
- 108
- Category
- Article
- ISSN
- 0167-2584
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Interaction of oxygen with evaporated nickel films has been studied by v ~-ray photoelectron spectrosmpy. XPS, over the temperature nnge 77-500 K and pressure range 10mg -IO4 torr. Three oxygen species Iiave been- positively,identified from O(ls) bir.ding energy shifts (I, II and III with BE's 5295.