Evidence for formation of low resistance TiSi2 layer with Ti/NSi/Ti/native oxide/PSi (100) stack

✍ Scribed by Awatar Singh; W.S. Khokle; R.K. Jaiswal; S.A.A. Shah

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 117 KB
• Volume: 32
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(89)90132-9