Evidence for a Radical Mechanism in Monolayer Formation on Silicon Ground (or Scribed) in the Presence of Alkyl Halides

✍ Scribed by Jiang, Guilin; Niederhauser, Travis L.; Fleming, Steven A.; Asplund, Matthew C.; Linford, Matthew R.

• Book ID: 126058762
• Publisher: American Chemical Society
• Year: 2004
• Tongue: English
• Weight: 134 KB
• Volume: 20
• Category: Article
• ISSN: 0743-7463
• DOI: 10.1021/la035662r