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Evaluation of Moiré patterns obtained by the “self-comparison-method” to characterize particle beam lithography systems

✍ Scribed by H.W.P. Koops; H. Oki; W. Betz; H.J. Huen; R. Zengerle


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
467 KB
Volume
11
Category
Article
ISSN
0167-9317

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