✦ LIBER ✦
Evaluation of focused O+ion beams as a tool for making resist masks by reactive etching
✍ Scribed by V. A. Zhukov; A. I. Titov; N. T. Bagraev; M. M. Nesterov
- Book ID
- 110214264
- Publisher
- Springer
- Year
- 2006
- Tongue
- English
- Weight
- 166 KB
- Volume
- 35
- Category
- Article
- ISSN
- 1063-7397
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