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EUV resist simulation with rigorous mask computation and simplified resist models

✍ Scribed by A. Jouve; D. Fuard; V. Farys


Book ID
104050506
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
143 KB
Volume
83
Category
Article
ISSN
0167-9317

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πŸ“œ SIMILAR VOLUMES


Simplified resist models for efficient s
✍ B. TollkΓΌhn; A. Erdmann; A. Semmler; C. NΓΆlscher πŸ“‚ Article πŸ“… 2005 πŸ› Elsevier Science 🌐 English βš– 182 KB

Nowadays, users of optical lithography simulation tools have to determine more than 40 parameters before simulation can be started. Furthermore, the simulation of areas larger than 1 lm 2 is hardly possible by full models, as computation time increases dramatically with the accuracy which is request