Simplified resist models for efficient s
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B. TollkΓΌhn; A. Erdmann; A. Semmler; C. NΓΆlscher
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Article
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2005
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Elsevier Science
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English
β 182 KB
Nowadays, users of optical lithography simulation tools have to determine more than 40 parameters before simulation can be started. Furthermore, the simulation of areas larger than 1 lm 2 is hardly possible by full models, as computation time increases dramatically with the accuracy which is request