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Etching Silicon with HF-HNO 3 -H 2 SO 4 /H 2 O Mixtures - Unprecedented Formation of Trifluorosilane, Hexafluorodisiloxane, and Si-F Surface Groups

✍ Scribed by Lippold, Marcus; Böhme, Uwe; Gondek, Christoph; Kronstein, Martin; Patzig-Klein, Sebastian; Weser, Martin; Kroke, Edwin


Book ID
118758174
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
667 KB
Volume
2012
Category
Article
ISSN
1434-1948

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