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Etching of n-Si(111) in 40% NH4F Solution Investigated by OCP, In Situ EC-STM, and ATR-FTIR Spectroscopic Methods

✍ Scribed by Bae, S.-E.; Yoon, J.-H.; Lee, C.-W.J.

Book ID: 127211420
Publisher: American Chemical Society
Year: 2008
Tongue: English
Weight: 330 KB
Volume: 112
Category: Article
ISSN: 1932-7447
DOI: 10.1021/jp076673m

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