✦ LIBER ✦
Etching characteristics of polysilicon, SiO2 and MoSi2 in NF3 and SF6 plasmas : C. S. Korman, T. P. Chow and D. H. Bower. Solid St. Technol., 115 (January 1983)
- Publisher
- Elsevier Science
- Year
- 1983
- Tongue
- English
- Weight
- 134 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0026-2714
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