✦ LIBER ✦
Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresists
✍ Scribed by P. Argitis; M.A. Vasilopoulou; E. Gogolides; E. Tegou; M. Hatzakis; Z. Kollia; A.C. Cefalas
- Book ID
- 114155807
- Publisher
- Elsevier Science
- Year
- 1998
- Tongue
- English
- Weight
- 252 KB
- Volume
- 41-42
- Category
- Article
- ISSN
- 0167-9317
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