Escape Probability of Signal Auger and Photoelectrons from Ultrathin Overlayers

✍ Scribed by Tilinin, I. S.; Zemek, J.; Hucek, S.

• Publisher: John Wiley and Sons
• Year: 1997
• Tongue: English
• Weight: 294 KB
• Volume: 25
• Category: Article
• ISSN: 0142-2421
• DOI: 10.1002/(sici)1096-9918(199708)25:9<683::aid-sia282>3.0.co;2-g

✦ Synopsis

The angular and energy distributions of signal Auger and photoelectrons escaping from a non-uniform sample have been found by solving a kinetic equation satisfying the appropriate boundary condition. In the particular case of an overlayer/substrate structure, the escape probability has been shown to depend strongly on the overlayer thickness. The inÑuence of elastic scattering of signal electrons on the recorded intensity increases as the overlayer thickness increases. The dependence of the intensity of Al 2s and Al 2p photoelectron lines excited by Al Ka radiation on the thickness of ultrathin aluminium oxide Ðlms deposited on an aluminium substrate has been measured and compared with the analytical results. Generally, good agreement between theory and experiment is observed. 1997