Er/Yb Doped Porous Silicon—A Novel White
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L. Luo; X. X. Zhang; K. F. Li; K. W. Cheah; J. X. Shi; W. K. Wong; M. L. Gong
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Article
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2004
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John Wiley and Sons
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English
⚖ 153 KB
actants with argon as the carrier gas. Growth time varied from 0.5 to 2.0 h, so as to obtain different thickness of films. ZnO nanoneedle arrays were prepared on Si substrates at the same growth temperature using the same MOCVD system [7]. Prior to the nanoneedle growth, no metal catalyst was deposi