✦ LIBER ✦
Erratum: Silicon dioxide fine patterning by reactive fast atom beam etching [J. Vac. Sci. Technol. B 6, 1565 (1988)]
✍ Scribed by H. Kuwano
- Book ID
- 126510538
- Publisher
- AVS (American Vacuum Society)
- Year
- 1990
- Tongue
- English
- Weight
- 232 KB
- Volume
- 8
- Category
- Article
- ISSN
- 0734-211X
- DOI
- 10.1116/1.585019
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