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Erbium incorporation in plasma-deposited amorphous silicon

✍ Scribed by E.I. Terukov; O.I. Konkov; V.Kh. Kudoyarova; K.V. Koughia; G. Weiser; H. Kühne; J.P. Kleider; C. Longeaud; R. Brüggemann

No coin nor oath required. For personal study only.

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