EPR and TSCR investigations of implanted AlSiO2Si systems treated with RF plasma discharge

✍ Scribed by Lysenko, V. S. ;Nazarov, A. N. ;Valiev, S. A. ;Zaritskii, I. M. ;Rudenko, T. E. ;Tkachenko, A. S.

• Publisher: John Wiley and Sons
• Year: 1989
• Tongue: English
• Weight: 810 KB
• Volume: 113
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.2211130248