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Epitaxial growth of silicon from SiH4 in the temperature range 800–1150°C : W. G. Townsend and M. E. Uddin. Solid St. Electron. 16 (1973), p. 39


Publisher
Elsevier Science
Year
1973
Tongue
English
Weight
103 KB
Volume
12
Category
Article
ISSN
0026-2714

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