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Enhanced sensitivity in the electron beam resist poly(methyl methacrylate) using improved solvent developer

✍ Scribed by Mahmood A. Mohsin; John M.G. Cowie


Book ID
107845039
Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
806 KB
Volume
29
Category
Article
ISSN
0032-3861

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