Engineering the phase speed of surface-plasmon wave at the planar interface of a metal and a chiral sculptured thin film

✍ Scribed by Akhlesh Lakhtakia; John A. Polo Jr

• Publisher: John Wiley and Sons
• Year: 2008
• Tongue: English
• Weight: 295 KB
• Volume: 50
• Category: Article
• ISSN: 0895-2477
• DOI: 10.1002/mop.23511

✦ Synopsis

Abstract

The solution of a boundary‐value problem formulated for a modified Kretschmann configuration shows that the phase speed of a surface‐plasmon wave guided by the planar interface of a sufficiently thin metal film and a chiral sculptured thin film (STF) depends on the vapor incidence angle used while fabricating the chiral STF by physical vapor deposition. Therefore, it may be possible to engineer the phase speed quite simply by selecting an appropriate value of the vapor deposition angle (in addition to the metal and the evaporant species). © 2008 Wiley Periodicals, Inc. Microwave Opt Technol Lett 50: 1966–1970, 2008; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.23511