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Ellipsometry as applied to the measurement of the thicknesses and indices of oxide films on silicon : Ph. Bied-Charreton. Rev. Tech. Thomson-CSF3, No. 4, December (1971), p. 679. (In French.)


Publisher
Elsevier Science
Year
1972
Tongue
English
Weight
104 KB
Volume
11
Category
Article
ISSN
0026-2714

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