Enhancement in ellipsometric thin film s
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Arwin, H. ;Poksinski, M. ;Johansen, K.
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Article
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2008
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John Wiley and Sons
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English
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## Abstract Ellipsometry used in internal reflection mode exhibits enhanced thin film sensitivity if operated close to surface plasmon resonance conditions. Compared to conventional ellipsometry, the changes in the ellipsometric parameter __ฮ__ are several orders of magnitude larger. Here, the orig