Ellipsometric study of low-temperature silicon surface cleaning during the process of reactive ionized cluster beam deposition

✍ Scribed by M. Koshinaka; H. Fujii; K. Nakanishi; Y. Shibuya

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 585 KB
• Volume: 168
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(89)90693-7