✦ LIBER ✦
Elevated source/drain by sacrificial selective epitaxy for high performance deep submicron CMOS: Process window versus complexity
✍ Scribed by Augendre, E.; Rooyackers, R.; Caymax, M.; Vandamme, E.P.; De Keersgieter, A.; Perello, C.; Van Dievel, M.; Pochet, S.; Badenes, G.
- Book ID
- 114538223
- Publisher
- IEEE
- Year
- 2000
- Tongue
- English
- Weight
- 169 KB
- Volume
- 47
- Category
- Article
- ISSN
- 0018-9383
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