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Electronic effect on the ductility of alloyed TiAl compound

✍ Scribed by Morinaga, M.; Saito, J.; Yukawa, N.; Adachi, H.

Book ID
123140193
Publisher
Elsevier Science
Year
1990
Weight
360 KB
Volume
38
Category
Article
ISSN
0956-7151

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## Abstract F‐implantation concentration profile simulations were carried out and the influence of the ion fluence, implantation energy as well as the alloy composition were investigated. For alloys with Al contents between 40 and 50 at% the conditions to get the halogen effect were assessed by the