✦ LIBER ✦
Electronic and annealing properties of the E0.31 defect introduced during Ar plasma etching of germanium
✍ Scribed by F.D. Auret; S.M.M. Coelho; G. Myburg; P.J. Janse van Rensburg; W.E. Meyer
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 199 KB
- Volume
- 404
- Category
- Article
- ISSN
- 0921-4526
No coin nor oath required. For personal study only.