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Electron spin resonance study of the effect of applied stress during thermal oxidation of (1 1 1)Si on inherent Pb interface defects

✍ Scribed by D. Pierreux; A. Stesmans; R.J. Jaccodine; M.-T. Lin; T.J. Delph

Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 189 KB
Volume: 72
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2003.12.019

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Electron spin resonance study of the effect of applied stress during thermal oxidation of (1&#xa0;1&#xa0;1)Si on inherent Pb interface defects

Electron spin resonance study of the effect of applied stress during thermal oxidation of (1 1 1)Si on inherent Pb interface defects