𝔖 Bobbio Scriptorium
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Electron-sensitive resists. II. Positive resists derived from high polymers of methyl methacrylate, methyl α-chloroacrylate, and hexyl methacrylate

✍ Scribed by Juey H. Lai; Suresh Shrawagi


Publisher
John Wiley and Sons
Year
1978
Tongue
English
Weight
331 KB
Volume
22
Category
Article
ISSN
0021-8995

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