Electron mobility in Si-MOSFETs with an additional implanted channel : W. Fischer, E. P. Jacobs, I. Eisele and G. Dorda. Solid-St. Electron.22, 225 (1979)

• Publisher: Elsevier Science
• Year: 1979
• Tongue: English
• Weight: 125 KB
• Volume: 19
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(79)90582-1