Electron Mobility in Ge, Si, and GaP
β Scribed by D. L. Rode
- Publisher
- John Wiley and Sons
- Year
- 1972
- Tongue
- English
- Weight
- 638 KB
- Volume
- 53
- Category
- Article
- ISSN
- 0370-1972
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β¦ Synopsis
Abstract
Theoretical calculations of electron mobility in the indirect crystals Ge, Si, and GaP are presented. The model assumes parabolic and spherical conduction band minima and includes piezoelectric, acoustic, polar, Coulomb, and intervalley scattering with appropriate electronβphonon selection rules in all cases. Fermi statistics are accounted for and no further approximations (e.g. relaxation, trial function) are made, since drift mobility is calculated from an exact iterated solution. Recent selection rules for Si and GaP lead to agreement with experiment and suggest that lowβenergy LA phonons are unimportant for intervalley scattering.
π SIMILAR VOLUMES
A theoretical proposal is given for creating direct-gap semiconductor layers in silicon-based Group IV heterostructures. Based upon recent bandstructure calculations for pseudomorphic \(\mathrm{Ge} / \mathrm{GeSi}\) and \(\mathrm{GeSi} / \mathrm{Ge}\), we predict a strain-induced \(\Gamma^{\mathrm{C