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Electron Microscope Image Profiles of Paired and Triple Dislocations

✍ Scribed by R. J. Murphy; J. L. Crawford


Publisher
John Wiley and Sons
Year
1968
Tongue
English
Weight
655 KB
Volume
27
Category
Article
ISSN
0370-1972

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Resist profiles in PMMA are simulated for the case of single and triple layer electron beam lithography. Line width variations and edge slopes are compared in two cases. Improvements in line width variation and edge slopes have been shown to occur after proximity exposure correction. Further in the