๐”– Bobbio Scriptorium
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Electron impact ionization of tetramethylsilane (TMS)

โœ Scribed by R Basner; R Foest; M Schmidt; F Sigeneger; P Kurunczi; K Becker; H Deutsch


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
913 KB
Volume
153
Category
Article
ISSN
0168-1176

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The yield of electrons formed on exposure of liquid tetramethy%lane to 5.48 MeV alpha particles has been measured as a fun&on of eh~tsic field. The number of electrons released per alpha was determined by puise height analysis using a charge sensitive detector\_ The yieIds are low and increase with