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Electron energy-loss spectroscopy of NO, O2 and NH3 on Si (1 1 1) surfaces

✍ Scribed by M. Nishijima; K. Fujiwara

Publisher
Elsevier Science
Year
1977
Tongue
English
Weight
287 KB
Volume
24
Category
Article
ISSN
0038-1098

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## Abstract CCl~2~ free radicals were produced by a pulsed dc discharge of CCl~4~ in Ar. Ground electronic state CCl~2~(X) radicals were electronically excited to the A^1^B~1~ (0,4,0) vibronic state with an Nd:YAG laser pumped dye laser at 541.52 nm. Experimental quenching data of excited CCl~2~(A^