Electron Cyclotron Resonance Ion Sources and ECR Plasmas
โ Scribed by Geller, R
- Publisher
- Routledge;CRC
- Year
- 2018
- Tongue
- English
- Leaves
- 449
- Category
- Library
No coin nor oath required. For personal study only.
โฆ Synopsis
Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources.
Abstract: Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources
โฆ Table of Contents
Content: Cover
Half Title
Title Page
Copyright Page
Table of Contents
Preface
Acknowledgments
1: SPECIFIC ELEMENTS OF PLASMA PHYSICS APPLIED TO ELECTRON CYCLOTRON RESONANCE ION SOURCES (ECRIS)
1.1 The breakthrough of the ECRIS and its plasma background
1.2 Preliminary aspects of plasma at the electron cyclotron resonance
1.3 Collective plasma phenomena
1.4 Atomic physics background in ECRIS plasma
1.5 Motions of charged particles in ECRIS plasma
1.6 Confinement in magnetic mirror fields
1.7 The difficult modelling of diffusion processes in magnetoplasmas
2: WAVE-PLASMA INTERACTIONS 2.1 Basic aspects of small amplitude EM waves incident on a cold magnetoplasma2.2 Specific aspects of waves in warm plasma
2.3 Electron heating in the ECR plasma
2.4 Wave launchers and coupling structures
3: THE ECRIS PLASMA STATES-BREAKDOWN, STEADY STATE AND AFTERGLOW
3.1 ECRIS breakdown at low pressure in a vacuum cavity
3.2 ECRIS steady state discharges, a tentative physical analysis
3.3 Simple magnetic bottle ECRIS
experimental steady state characteristics
3.4 Min-B ECRIS: steady state electron characteristics
3.5 ECRIS afterglow regimes (or post-discharge) 4.9 Ion extraction from the ECRIS plasma4.10 Emittance of a source (generalities)
4.11 ECRIS beam emittances
5: SIMPLE MIRROR AND BUCKET ECRIS FOR LESS HIGHLY CHARGED IONS
5.1 The history of the first ECR ion sources (1965-1973)
5.2 Modern simple mirror ECRIS
5.3 Overdense ECRIS at 2.45 GHz for ion beam processing
5.4 Industrial ECR plasma and ion sources research at Michigan State University
5.5 ECR plasma cathode (also called microwave plasma cathode)
5.6 ECRIS for specific weakly charged ions
6: MIN-B ECRIS FOR HIGHLY CHARGED IONS 6.1 A brief history of the development of ECRIS for multiply charged ions6.2 The status of understanding of min-B ECRIS
6.3 The magnetic structure in modern min-B ECRIS
6.4 Highly charged metal ions production in min-B ECRIS
6.5 Specific applications of the min-B ECRIS
6.6 Scaling rule attempts and practical results
6.7 Comparative min-B ECRIS
6 .8 Conclusions and prospects of min-B ECRIS
References
Index
โฆ Subjects
Electron cyclotron resonance sources;Plasma (Ionized gases);Heavy ions
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