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Electromigration resistance of sputtered silver lines using different patterning techniques

✍ Scribed by M Hauder; W Hansch; J Gstöttner; D Schmitt-Landsiedel


Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
729 KB
Volume
60
Category
Article
ISSN
0167-9317

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✦ Synopsis


Electromigration was investigated for sputtered Ag lines patterned by wet etching or by a novel hybrid etching technique. This new patterning technique works in two steps. After employing an oxygen plasma in the first step, a hydrogen peroxide solution is used in the second step. This technique shows an almost anisotropic etching behavior in contrast to the investigated wet etching techniques. The hybrid etched patterns were found to have an increased lifetime with up to about a threefold value in comparison to the best wet etched Ag lines.