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Electrochromic performance of reactive plasma-sputtered NiOx thin films on flexible PET/ITO substrates for flexible electrochromic devices

✍ Scribed by Yung-Sen Lin; Po-Wen Chen; Di-Jiun Lin; Pei-Ying Chuang; Tsung-Hsien Tsai; Yui-Chuin Shiah; Yueh-Chung Yu

Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 982 KB
Volume: 205
Category: Article
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2010.07.088

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The reactive sputtering deposition of electrochromic thin films of V 2 O 5 -z onto flexible PET/ITO substrates using argon and oxygen at room temperature (23 °C) was investigated. Cyclic voltammetry measurements showed that only low driving voltages, between -0.6 V and +1 V, were needed to provide r