The oxidation of CH 4 with CO2, H20(v ) and 0 2 has been studied under radiofrequency plasmas at a pressure of 20 Torr, by feeding the reactor with mixtures of methane and oxidizing agents, at variable gas flow rates (6-30 liters (STP) rain -1) and power densities (2-8 cal cm -3 sec--1). The oxidati
β¦ LIBER β¦
Electrochemistry in liquid sulfhur dioxide: Part II. Oxidation of thiantherene in the presence of water and anisole
β Scribed by Lawrence A. Tinker; Allen J. Bard
- Publisher
- Elsevier Science
- Year
- 1982
- Weight
- 832 KB
- Volume
- 133
- Category
- Article
- ISSN
- 0022-0728
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