The deposition of nickel/amorphous carbon (Ni/a-C) films by a hybrid plasma process combining magnetron sputtering of a Ni target and plasma enhanced chemical vapor deposition using methane gas has been investigated. The formation of nickel nanowires encapsulated by a-C matrix has been demonstrated
Electrochemical durability of carbon nanotubes at 80 °C
✍ Scribed by Liang Li; Yangchuan Xing
- Book ID
- 108192602
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 367 KB
- Volume
- 178
- Category
- Article
- ISSN
- 0378-7753
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