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Electrochemical deposition of Copper on patterned Cu/Ta(N)/SiO2surfaces for super filling of sub-micron features

✍ Scribed by W.H. Li; J.H. Ye; S.F.Y. Li


Book ID
110325054
Publisher
Springer
Year
2001
Tongue
English
Weight
241 KB
Volume
31
Category
Article
ISSN
0021-891X

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