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Electrochemical Deposition of Conductive Superhydrophobic Zinc Oxide Thin Films

✍ Scribed by Li, Mei; Zhai, Jin; Liu, Huan; Song, Yanlin; Jiang, Lei; Zhu, Daoben

Book ID
120088798
Publisher
American Chemical Society
Year
2003
Tongue
English
Weight
392 KB
Volume
107
Category
Article
ISSN
0022-3654

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## Abstract Atomic layer deposition (ALD) was used to fabricate transparent and conductive thin films of ZnO. Two hundred‐nano metre thick ZnO films were deposited on glass substrates at low growth temperatures varied between 120 and 240 °C. As zinc and oxygen precursors we used diethylzinc (DEZn)