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Electrochemical behaviour of copper electrode in concentrated sulfuric acid solutions

✍ Scribed by A.H. Moreira; A.V. Benedetti; P.L. Cabot; P.T.A. Sumodjo

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
641 KB
Volume
38
Category
Article
ISSN
0013-4686

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✦ Synopsis

The electrochemical behaviour of copper in 6.0moll-' sulfuric acid at 3o"C, was studied by means of the potentiodynamic method.

At low potential sweep rates, u < ZOOmVs-', the data reveal that the anodic process is basically constituted of copper dissolution and a film formation which inhibits further metal oxidation and which may undergo further dissolution. For higher potential sweep rates, a modification in the passivation region of the voltammogram is observed. It can be ascribed to a change in the passivation mechanism which possibly involves different surface species. The kinetic relationships derived from the potentiodynamic l/E curves obtained at low u suggest a film formation via a dissolution/precipitation mechanism.

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