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Electrochemical behavior and polishing properties of silicon wafer in alkaline slurry with abrasive CeO2
✍ Scribed by Xiao-lan SONG; Da-yu XU; Xiao-wei ZHANG; Xun-da SHI; Nan JIANG; Guan-zhou QIU
- Book ID
- 117693506
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 332 KB
- Volume
- 18
- Category
- Article
- ISSN
- 1003-6326
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