Electrochemical and photoelectrochemical study of pure and iron implanted copper in alkaline medium
β Scribed by E Angelini; M Bassoli; P.L Bonora; M Maja; P Mazzoldi
- Publisher
- Elsevier Science
- Year
- 1981
- Weight
- 592 KB
- Volume
- 6
- Category
- Article
- ISSN
- 0390-6035
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β¦ Synopsis
An electrochemical and photoelectrochemical study of pure and iron implanted copper in alkaline solution has been performed by means of:
photopotential measurements at different electrodic voltages; -voltammetric curves tracing, in order to reveate the effects induced by light on the current; -polarization resistance (Rp) measurements, in order to determine the corrosion rate of the electrodes.
The reduction mechanism on pure copper are discussed. Iron, entering the surface oxide lattice in iron implanted copper, stabilizes the passive film in alkaline solution.
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