Structural and optical properties of dia
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M. Rubio-Roy; E. Pascual; M.C. Polo; J.L. Andújar; E. Bertran
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Article
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2008
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Elsevier Science
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English
⚖ 342 KB
In contrast with PECVD technology, reactive sputtering of graphite allows an independent control of the substrate bias. This characteristic permits the modification of film properties without varying the plasma composition. In the present study, the characteristics of DLC films grown by pulsed-DC re